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Laboratory Facilities

Computation 

A computer cluster of 320 cores, with 2.8 GHz speed and 132 GB RAM is dedicated to the Interfaces Engineering Laboratory, with additional shared resource at the Massachusetts Green High-Performance Computing Center (MGHPCC).

 

 

 

 

 

 

 Experimental

Electron-beam evaporation physical vapor deposition chamber, with temperature control down to 77 K, base pressure of 1 x 10-9 torr, working pressure of 1 x 10-7 torr. There are twelve source material holders in two separate electron gun assemblies, allowing for deposition of two materials at once or rapid production of multiple layer films. The system has capabilities of depositing several atomic layers to several microns of source material, through 10 kW of power available to bombard the sources with electrons. A load lock and transfer arm allow for fast sample changes.

 

 

 

Electron-beam evaporation physical vapor deposition chamber, with temperature control down to 77 K, base pressure of 1 x 10-7 torr, working pressure of 1 x 10-5 torr. There are four source material holders in the chamber as well as multiple substrate targets, so it is feasible to switch from one source material or substrate to another without affecting the vacuum. The system has capabilities of depositing several atomic layers to several microns of source material, through 6 kW of power available to bombard the source with electrons.

 

 

 

High temperature thermal evaporation chamber, with temperature up to 1600 ºC, base pressure of 1 x 10-5 mbar, and working pressure of 100 mbar.